lab-scale desktop single-target DC magnetron sputtering coaing machine

DC magnetron sputtering coaing machine can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. It is an ideal equipment for laboratory preparation of material films.

Technical parameters:
1.Sample stage
Size：φ138mm
Temperature control accuracy：±1℃
Heating temperature：Max 500℃
Rotate speed：1-20rpm adjustable
2.Magnetron Sputtering target head 2-inch×1 (1-inch,2-inch optional)Circulating water chiller with flow rate of 10L/min
3.Vacuum chamber
Chamber size:φ180mm×215mm
Watch window:Omnidirectional transparent
Chamber material:High purity quartz
Opening mode:Top cover removable
Vacuum system Model：CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement：Compound vacuum gauge
Ultimate vacuum：1.0E-5Pa
Power supply：AC;220V 50/60Hz
Pumping rate：Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
4.Power configuration DC power supply x1；Max output power 150W
5.Other parameters Supply voltage：AC220V,50Hz
6.Overall size：500mm×350mm×400mm
7.Total power：1.7KW (Vacuum pump1.5KW+machine0.2KW)
8.Total Weight：About 30kg